film sample造句

• In our experiment , the structure of the pzt thin film sample is pt / pzt / ybco / lao . lao is the substrate
  本文基于前人的实验理论，率先研究了锆钛比为94 6的锆钛酸铅薄膜的性能。
• In this thesis , the thermal distortion and the weak absorption of thin film samples irradiated by 10 . 6 m co2 laser were studied
  因此，本文对10 . 6 mco _ 2激光辐照下的样品的热畸变和微弱吸收进行了研究。
• In this paper , several thin films samples of vanadium oxide were got by high - frequency magnetron sputter with pure metal vanadium as sputter source
  本文以高纯金属钒作为靶材，采用磁控溅射工艺制备氧化钒薄膜。
• At last , the diamond film samples were investigated by x - ray - diffraction ( xrd ) and scanning electron microscopy ( sem ) in this paper
  另外，本实验通过x衍射分析( xrd )和扫描电子显微镜( sem )对上述条件制备的金刚石膜结构和表面形貌进行表征。
• The tungsten oxide films with catalyst by two methods were characterized by x - diffractometer , tunnel scan - atomic force microscope , ft - ir , double - beam uv - vis - nir spectrophotometer and speediness volt - ampere cycle meter . as results of x - diffractometer , pt / wo3 sputtered film samples are crystal when annealed at 400 with distinct diffractive acuti - apices
  本文分别用x衍射仪、隧道-原子力显微镜、傅立叶变换红外光谱仪、双束紫外可见分光光度计、快速伏安循环法等表征了用以上两种方法制备的三氧化钨掺杂薄膜。
• This paper has first summarized the experiment of granular film and theoretical research progress and the present major problem to be solved , has discussed the purpose meaning of this paper on this foundation , has introduced us soon afterwards with magnetic metal - non - magnetic metal material adopt for studying object to co - vapored deposited system such as the fexcu1 - x of different fe content x granular film sample , carrying out annealing handling for some of samples , using x ray diffraction instrument xrd ) , , scanning electrical microscopic ( sem ) , vibrating sample magnetometer ( vsm ) the tiny structure for sample , appearance and the magnetic result that can carry out detection
  本文首先综述了颗粒膜的实验和理论研究进展情况和目前待解决的主要问题，在此基础上论述了本文的目的意义，随后介绍了我们以磁性金属?非磁性金属材料为研究对象，采用共蒸发法制备不同fe含量x的fe _ xcu _ ( 1 - x ) ，颗粒膜样品，对部分样品进行退火处理。给出了用x射线衍射仪( xrd ) 、扫描电镜( sem ) 、振动样品磁强计( vsm )对样品的微结构、形貌及磁性能进行检测的结果。
• The magnetron sputtering method is adopted to grow single film samples , we take the precision measurement of stress by zygo interferometer . it is observed that growth of the mo component in multilayers is tensile , while si is compressive . study of stress in mo / si multilayers are carried out for application of extreme ultraviolet multilayer coatings in the diagnosed high dense plasmas and euvl
  研究了mo 、 si单层膜的应力状态；采用磁控溅射法在超光滑si基底上制备了mo 、 si单层膜，利用zygo干涉仪对其进行应力检测，检测结果表明：在13nmmo si多层膜中， mo单层膜表现为张应力， si单层膜表现为压应力。